Deposition of Si on ceramic tungsten carbide inserts by laser methods

Reference	Presenter	Authors (Institution)	Abstract
12-048	Rene Martins Volu	Volu, R.M.(Instituto Tecnológico de Aeronáutica); Silva, S.A.(Instituto de Estudos Avançados); Santos, C.L.(Instituto Federal de São Paulo); Contin, A.(Instituto Nacional de Pesquisas Espaciais); Claudino, M.F.(PROMARKING); Vasconcelos, G.d.(Instituto de Estudos Avançados);	WC-Co cutting tools are widely used by the industry, however, one of the biggest problems related to film deposition on these tools is the emergence of high levels of stress, which results in adhesion and displacement failures. To minimize these drawbacks, and to promote adhesion of the coating, surface preparation is a crucial step. In this work, the efficiency of the staged etching process using chemical solutions (Murakami and Regal Water) will be evaluated. Two groups of WC / Co samples were compared, one constituting the samples attacked with chemical solution to remove the Cobalt from the surface of interest as a function of the time of attack and the other with samples without chemical attack. A layer of 200 micrometers of silicon powder with a mean grain size of 4 micrometers in ethyl alcohol was sprayed with pneumatic gun on the WC-Co ceramic inserts of the two groups. After the alcohol evaporation, these sputtered samples were irradiated with a CO2 laser, with a beam diameter of 0.2mm and power of 25W, with two different scanning speeds of the beam. The samples were analyzed by MEV / FEG, EDS and XRD and also the Scratch test. Where it can be verified the increase of 20% in the adhesion of the film in the samples previously treated with the chemical attack, justifying the necessity of the same ones.
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